JPH0318347B2 - - Google Patents
Info
- Publication number
- JPH0318347B2 JPH0318347B2 JP56173825A JP17382581A JPH0318347B2 JP H0318347 B2 JPH0318347 B2 JP H0318347B2 JP 56173825 A JP56173825 A JP 56173825A JP 17382581 A JP17382581 A JP 17382581A JP H0318347 B2 JPH0318347 B2 JP H0318347B2
- Authority
- JP
- Japan
- Prior art keywords
- diffusion region
- transistor
- channel mos
- mos transistor
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/854—Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56173825A JPS5873147A (ja) | 1981-10-27 | 1981-10-27 | 半導体集積回路装置 |
US06/769,092 US4689653A (en) | 1981-10-27 | 1985-08-26 | Complementary MOS integrated circuit including lock-up prevention parasitic transistors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56173825A JPS5873147A (ja) | 1981-10-27 | 1981-10-27 | 半導体集積回路装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5873147A JPS5873147A (ja) | 1983-05-02 |
JPH0318347B2 true JPH0318347B2 (en]) | 1991-03-12 |
Family
ID=15967848
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56173825A Granted JPS5873147A (ja) | 1981-10-27 | 1981-10-27 | 半導体集積回路装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4689653A (en]) |
JP (1) | JPS5873147A (en]) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0654797B2 (ja) * | 1986-08-06 | 1994-07-20 | 日産自動車株式会社 | Cmos半導体装置 |
US4791317A (en) * | 1986-09-26 | 1988-12-13 | Siemens Aktiengesellschaft | Latch-up protection circuit for integrated circuits using complementary mos circuit technology |
US4791316A (en) * | 1986-09-26 | 1988-12-13 | Siemens Aktiengesellschaft | Latch-up protection circuit for integrated circuits using complementary MOS circuit technology |
JPS648659A (en) * | 1987-06-30 | 1989-01-12 | Mitsubishi Electric Corp | Supplementary semiconductor integrated circuit device |
US5136355A (en) * | 1987-11-25 | 1992-08-04 | Marconi Electronic Devices Limited | Interconnecting layer on a semiconductor substrate |
JPH02168666A (ja) * | 1988-09-29 | 1990-06-28 | Mitsubishi Electric Corp | 相補型半導体装置とその製造方法 |
US4939616A (en) * | 1988-11-01 | 1990-07-03 | Texas Instruments Incorporated | Circuit structure with enhanced electrostatic discharge protection |
US5406513A (en) * | 1993-02-05 | 1995-04-11 | The University Of New Mexico | Mechanism for preventing radiation induced latch-up in CMOS integrated circuits |
JP4548603B2 (ja) * | 2005-06-08 | 2010-09-22 | セイコーエプソン株式会社 | 半導体装置 |
RU2539869C1 (ru) * | 2013-12-24 | 2015-01-27 | Закрытое акционерное общество "Электронно-вычислительные информационные и инструментальные системы" (ЗАО "ЭЛВИИС") | Радиационно-стойкая библиотека элементов на комплементарных металл-окисел-полупроводник транзисторах |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3573509A (en) * | 1968-09-09 | 1971-04-06 | Texas Instruments Inc | Device for reducing bipolar effects in mos integrated circuits |
US3955210A (en) * | 1974-12-30 | 1976-05-04 | International Business Machines Corporation | Elimination of SCR structure |
JPS5238890A (en) * | 1975-09-23 | 1977-03-25 | Mitsubishi Electric Corp | Semiconductor device |
JPS53126280A (en) * | 1977-04-11 | 1978-11-04 | Hitachi Ltd | Complementary type mis semiconductor device |
GB1549130A (en) * | 1977-06-01 | 1979-08-01 | Hughes Microelectronics Ltd Cm | Monolithic integrated circuit |
JPS5939904B2 (ja) * | 1978-09-28 | 1984-09-27 | 株式会社東芝 | 半導体装置 |
-
1981
- 1981-10-27 JP JP56173825A patent/JPS5873147A/ja active Granted
-
1985
- 1985-08-26 US US06/769,092 patent/US4689653A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS5873147A (ja) | 1983-05-02 |
US4689653A (en) | 1987-08-25 |
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